Titanium targets have important applications in many industries. Do you know what requirements are required for a qualified titanium target?
To produce a qualified titanium sputtering target, purity is one of its important performance indicators. The purity of the sputter coater target has a great influence on the performance of the film.
Generally, the purity requirements of industrial targets are not high, but the sputter targets for semiconductors, display devices have very strict requirements. And with the development of science and technology, the requirements are getting more strict. For example, with the rapid development of the microelectronics industry, the size of silicon wafers has increased from 6″, 8″ to 12″, and the wiring width has been reduced from 0.5um to 0.25um, 0.18um or even 0.13um. Previously, the titanium target with a purity reached 99.995% can meet the process requirements of the electronics industry. But now, the industry requires 99.999% or even 99.9999% purity of the materials. Not all sputtering target manufacturers can supply such high purity targets.
Impurities in the target solids and oxygen and moisture in the pores are the main contamination of the deposited film. Therefore, in order to obtain a high-quality titanium target, it is necessary to control the impurity content of the target.
Similar to the first point, targets for different applications have different requirements for different impurity contents. For example, pure titanium and titanium alloy targets for semiconductor electrode wiring require less than 3*10-9 for radioactive elements such as U and Th.
Density is also an important factor in measuring the quality of titanium targets. In order to reduce pores in the solids of the target and improve the properties of the sputtered film, the target is usually required to have a higher density.
The density of the target not only affects the sputtering rate, but also affects the electrical and optical properties of the film. The higher the target density, the better the performance of the film. In addition, increasing the density and strength of the target allows the target to better withstand the thermal stresses during sputtering. Density is also one of the key performance indicators of the target.
Grain size and its distribution
Typically, the sputtering target is a polycrystalline structure having a grain size on the order of a few microns to millimeters.
For the same target, the smaller the particle size of the target, the faster the sputtering rate of the target; Further, a target having a smaller difference in grain size can sputter a film having a more uniform thickness.
Titanium Metal is a member of Stanford Advanced Materials and we supply people and companies with Molybdenum all over the world. For more information, please visit our official website www.samaterials.com. If you want to buy sputter coating materials, please visit www.sputtertargets.net.